Calculation of electron and hole impact ionization coefficients in SiGe alloys

نویسندگان

  • K. Yeom
  • J. M. Hinckley
  • J. Singh
چکیده

Silicon–germanium alloys offer a system where the ratio of the electron impact ionization coefficient ~a! and hole impact ionization coefficient ~b! varies from a value larger than unity ~in high silicon content alloys!, to a value smaller than unity ~in high germanium content alloys!. We report results for a and b for this alloy system. The electron results are based on a multivalley nonparabolic band structure. The hole results are based on a six-band k•p model for low energies coupled to an eight-band model for high energies. We find that for the alloy Si0.4Ge0.6, a;b. Alloy scattering is found to play an important role in determining the impact ionization coefficient. For compositions around Si0.5Ge0.5, the strong alloy scattering is found to suppress the impact ionization coefficient. © 1996 American Institute of Physics. @S0021-8979~96!03524-4#

برای دانلود متن کامل این مقاله و بیش از 32 میلیون مقاله دیگر ابتدا ثبت نام کنید

ثبت نام

اگر عضو سایت هستید لطفا وارد حساب کاربری خود شوید

منابع مشابه

Monte Carlo Simulation of Multiplication Factor in PIN In0.52Al0.48As Avalanche Photodiodes

In this paper, we calculate electron and hole impactionization coefficients in In0.52Al0.48As using a Monte Carlo modelwhich has two valleys and two bands for electrons and holesrespectively. Also, we calculate multiplication factor for electronand hole initiated multiplication regimes and breakdown voltagein In0.52Al0.48As PIN avalanche photodiodes. To validate themodel, we compare our simulat...

متن کامل

MOSFET Channel Engineering using Strained Si, SiGe, and Ge Channels

Biaxial tensile strained Si grown on SiGe virtual substrates will be incorporated into future generations of CMOS technology due to the lack of performance increase with scaling. Compressively strained Ge-rich alloys with high hole mobilities can also be grown on relaxed SiGe. We review progress in strained Si and dual channel heterostructures, and also introduce high hole mobility digital allo...

متن کامل

High Mobility Strained Si/SiGe Heterostructure MOSFETs

Strained Siand SiGe-based heterostructure MOSFETs grown on relaxed SiGe virtual substrates exhibit dramatic electron and hole mobility enhancements over bulk Si, making them promising candidates for next generation CMOS devices. The most heavily investigated heterostructures consist of a single strained Si layer grown upon a relaxed SiGe substrate. While this configuration offers significant pe...

متن کامل

Measurement of Collector-Base Junction Avalanche Multiplication Effects in Advanced UHV/CVD SiGe HBT’s

This paper presents measurements of the avalanche multiplication factor (M 1) in SiGe HBT’s using a new technique capable of separating the avalanche multiplication and Early effect contributions to the increase of collector current with collector-base bias, as well as allowing safe measurements at practical current densities. The impact of collector doping, current density, Ge profile, and ope...

متن کامل

Electron and hole impact ionization coefficients in GaAs/A10,45Ga0,55As/ Al,,3GaOS7As coupled well systems

We have measured electron and hole multiplication factors and impact ionization coefficients in 550 A GaAs/SOO A AbX3G%,,As quantum wells with an intermediate A&,.45Ga0.55As barrier (50 and 100 %L) inserted in the well region. It is seen that while the measured value of a(E) is insensitive to the position of the intermediate barrier in the well, the value of P(E) is very sensitive. The value of...

متن کامل

ذخیره در منابع من


  با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید

برای دانلود متن کامل این مقاله و بیش از 32 میلیون مقاله دیگر ابتدا ثبت نام کنید

ثبت نام

اگر عضو سایت هستید لطفا وارد حساب کاربری خود شوید

عنوان ژورنال:

دوره   شماره 

صفحات  -

تاریخ انتشار 1996